《氧化鋯陶瓷制造工藝配方精選》
耐高溫 機械強度高 耐損耗 超高功率 國家標準產品
New Technology Of Graphite Materials
國際新技術資料網 最新推出
2021新版《氧化鋯陶瓷制造工藝配方精選》
氧化鋯陶瓷的生產要求制備高純、分散性能好、粒子超細、粒度分布窄的粉體，氧化鋯超細粉末的制備方法很多，氧化鋯的提純主要有氯化和熱分解法、堿金屬氧化分解法、石灰熔融法、等離子弧法、沉淀法、膠體法、水解法、噴霧熱解法等。粉體加工方法有共沉淀法、溶膠一凝膠法、蒸發法、超臨界合成法、微乳液法、水熱合成法網及氣相沉積法等.
在功能陶瓷方面，其優異的耐高溫性能作為感應加熱管、耐火材料、發熱元件使用。氧化鋯陶瓷具有敏感的電性能參數，主要應用于氧傳感器、固體氧化物燃料電池(Solid Oxide Fuel Cell, SOFC）和高溫發熱體等領域。ZrO2具有較高的折射率（N-21^22），在超細的氧化鋯粉末中添加一定的著色元素（V2O5, MoO3, Fe2O3等），可將它制成多彩的半透明多晶ZrO2材料，像天然寶石一樣閃爍著絢麗多彩的光芒，可制成各種裝飾品。另外，氧化鋯在熱障涂層、催化劑載體、醫療、保健、耐火材料、紡織等領域正得到廣泛應用。
為了配合國家產業政策向廣大企業、科研院校提供的我國及國外最新工藝功能陶瓷及耐火制品技術制造工藝配方專利匯編技術資料。資料中每個項目包含了最詳細的技術制造 資料,現有技術問題及解決方案、產品生產工藝、配方、產品性能測試，對比分析。資料信息量大,實用性強,是從事新產品開發、參與市場競爭的必備工具。 本篇匯編資料分為精裝合訂本和光盤版，內容相同，用戶可根據自己需求購買?，F貨發行，歡迎新老客戶選購。特快專遞郵寄。資料分為上、下兩冊，A4紙大，共748頁現貨發行，歡迎訂購
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極紫外光刻膠（EUV光刻膠）技術：EUV光刻膠是目前最先進的光刻膠技術之一，主要用于極紫外光刻工藝，能夠實現極小的線寬和高分辨率的圖形轉移，是制造高端芯片的關鍵材料例如，JSR公司在2011年就與SEMATECH聯合開發出用于15nm工藝的化學放大型EUV光刻膠東京應化（TOK）也在EUV光刻膠領域處于領先地位，其在2020年擁有EUV光刻膠51.8%的市占率。
高靈敏度和高分辨率光刻膠技術：通過優化光刻膠的化學配方和結構，提高光刻膠對光的靈敏度和分辨率，從而實現更小的圖形尺寸和更高的集成度如Inpria生產的包含氧化錫的EUV光刻膠，具有良好的靈敏度，將EUV的吸收效率提升了4倍，并且可以實現更簡單的制造流程和更大的工藝窗口。
多層膜光刻技術：為了進一步提高光刻分辨率，采用多層膜光刻技術，通過在光刻膠層之間增加特殊的膜層，減少光的反射和散射，提高光刻的對比度和分辨率。
本資料是收錄涉及《國際光刻膠制造工藝配方精選匯編》最新專利技術資料，資料中包括制造原料、配方、生產工藝、產品性能測試及標準、實際應用效果，技術指標，解決的具體問題等等，是企業提高產品質量和發展新產品的重要、實用、超值和難得的技術資料。
【資料內容】制造工藝及配方
【資料語種】英文
【項目數量】56項
【電子版】1680元（PDF文檔 郵件發送）
目錄
| 序號 | 項目名稱 | 研制單位 |
| 1 | Enhanced Euv Materials, Photoresists And Methods Of Their Use | ROBINSON ALEX P G?[GB] JACKSON ED?[US] O'CALLAGHAN GREGORY?[GB] ROTH JOHN?[US] MCCLELLAND ALEXANDRA?[GB] LADA TOM?[US] POPESCU CARMEN?[GB] |
| 2 | Euv Lithography Using Polymer Crystal-Based Reticles | REKHI SANDEEP WALLING THOMAS JOHN FARRELL PICHUMANI PRADEEP SAILAM |
| 3 | Photoresist Composition For Euv, Method For Manufacturing Same, And Method For Forming Photoresist Pattern Using Same | HONG SUKWON?[KR] HWANG CHAN CUK?[KR] KIM DO WON?[KR] BYEON JIN HWAN?[KR] AHN JAE BOONG?[KR] |
| 4 | Pellicle For Euv Lithography And Method For Manufacturing Pillicle Film Of The Same | PARK CHUL KYUN HONG JU HEE CHOI MUN SU KIM DONG HOI |
| 5 | Pellicle For Euv Lithography | HONG JU-HEE?[KR] PARK CHUL-KYUN?[KR] CHOI MUN-SU?[KR] KIM DONG-HOI?[KR] |
| 6 | Method To Reduce Line Edge Roughness For Euv Photoresist Pattern | WANG XIN-KE?[CN] SHEN ZE-QING?[CN] SINGHA ROY SUSMIT?[IN] MALLICK ABHIJIT BASU?[US] BHUYAN BHASKAR JYOTI?[IN] TANG JIECONG?[SG] SUDIJONO JOHN?[US] SALY MARK?[US] |
| 7 | Enhanced Euv Photoresists And Methods Of Their Use | ROBINSON ALEX P G?[GB] JACKSON EDWARD?[US] ROTH JOHN?[US] LADA TOM?[US] O'CALLAGHAN GREG?[GB] |
| 8 | Organometallic Tin Clusters As Euv Photoresist | LU FENG?[US] |
| 9 | Euv Low Roughness Euv Lithography | WISE RICHARD SHAMMA NADER |
| 10 | Enhanced Euv Photoresist And Methods Of Use Thereof | ROBINSON ALEX P G JACKSON EDWARD ROTH JOHN LADA TOM O 'CALLAGHAN GREG |
| 11 | Pellicle For Euv Lithography | HONG JU HEE JUNG MIN WOOK CHOI MUN SU |
| 12 | Method Of Euv Lithography | CHEN TAI-YU?[TW] KHIVSARA SAGAR DEEPAK?[IN] CHIEN SHANG-CHIEH?[TW] LAM KAI TAK?[SG] YU SHENG-KANG?[TW] |
| 13 | Euv Composition For Semiconductor Euv Lithography And Method For Semiconductor Euv Lithography Using The Same | LEE GEUN SU?[KR] LEE YEONG SEON SEONG YEON HEE KIM SEOK HYUN KIM YOUNG CHAN CHEON JONG HYEON LEE SEUNG HYUK |
| 14 | Pellicle For Euv Lithography Masks And Methods Of Manufacturing Thereof | HSU PEI-CHENG?[TW] SUN TING-PI?[TW] LEE HSIN-CHANG?[TW] |
| 15 | Euv Metal Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 16 | Euv Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 17 | Euv/Eb Photoresist As Well As Preparation Method And Application Thereof | FANG SHUNONG WANG SU TANG CHEN |
| 18 | Euv Photomask And Manufacturing Method Of The Same | HSU FENG YUAN?[TW] SHEN TRAN-HUI?[TW] HSU CHING-HSIANG?[TW] |
| 19 | Euv Euv Dose Reducing Layers Related Structures And Methods And Systems For Their Manufacture | FATEMEH DAVODI PAUL CHATELAIN CHARLES DEZELAH |
| 20 | Method Of Forming Carbon-Based Spacers For Euv Photoresist Patterns | WANG XINKE SHEN ZEQING ROY SUMEET SINGH MALLIK ABHIJIT BASU BHUYAN BHASKAR JYOTI TANG JIECONG SUDIJONO JOHN SALY MARK |
| 21 | Zirconium-Coated Ultra-Thin, Ultra-Low Density Films For Euv Lithography | LIMA MARCIO D?[US] GRAHAM MARY VIOLA?[US] UEDA TAKAHIRO?[US] |
| 22 | Euv Membrane For Euv Lithography And Manufacturing Method For The Same | YU LAN SEO KYOUNG WON PARK JIN SU YANG SEONG JU HONG SEONG GYU LEE HWA CHOL KIM CHEONG KIM KYOUNG SOO YUN WOO HYUN CHO SANG JIN LEE DONG HOON LEE SO YOON PARK SEONG HWAN KIM YONG SU KANG HONG GU CHOI JAE HYUCK |
| 23 | Euv Euv An Euv Pellicle Frame And An Euv Pellicle Using It | HORIKOSHI JUN?[JP] |
| 24 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 25 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI?[KR] |
| 26 | Euv The Manufacturing Method Of Pellicle For Protecting Euv Photomask Using Reinforeced Pad | KIM YONG KI?[KR] |
| 27 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI?[KR] |
| 28 | Implant Into Euv Metal Oxide Photoresist Module To Reduce Euv Dose | PRASAD RAJESH?[US] LIN YUNG-CHEN?[US] HUANG ZHIYU?[US] WANG FENGLIN?[US] LANG CHI-I?[US] HWANG HOYUNG DAVID?[US] AREVALO EDWIN A?[US] SHIM KYUHA?[US] |
| 29 | Method Of Manufacturing Euv Photo Masks | LEE HSIN-CHANG?[TW] HSU PEI-CHENG?[TW] LIEN TA-CHENG?[TW] WANG TZU YI?[TW] |
| 30 | Blankmask And Photomask For Euv Lithography With Backside Conductive Layer | WOO MI KYUNG PARK MIN KYU YANG CHUL KYU |
| 31 | Euv Euvextreme Ultraviolet Mask And Method For Manufacturing The Same | JANG SUNG WOO LEE SUN PYO JUNG EUI HAN |
| 32 | Euv The Manufacturing Method Of Graphene Membrane Pellicle For Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 33 | Enhanced Euv Photoresist Including A Core Tris(4-Hydroxyphenyl)Methane Group And Having Improved Sensitivity (Photosensitivity), Resolution (Line Width Roughness), Or Both | ROBINSON ALEX P G?[GB] MCCLELLAND ALEXANDRA?[GB] O '' CALLAGHAN GREG?[GB] JACKSON ED?[US] NGUYEN VAN HUY?[GB] MELONI FERNANDA?[IT] |
| 34 | Phase Shift Blank Mask And Photomask For Euv Lithography | KIM YONG-DAE LEE JONG-HWA YANG CHUL KYU |
| 35 | Methods For Making Euv Patternable Hard Masks | WU CHENGHAO TIMOTHY WILLIAM WEIDMAN KATIE NARDI |
| 36 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | CHAO TZU-ANG?[TW] CHENG CHAO-CHING?[TW] WANG HAN?[TW] |
| 37 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 38 | Reflective Mask Blank For Euv Lithography, Mask Blank For Euv Lithography, And Manufacturing Methods Thereof | AKAGI DAIJIRO?[JP] KAWAHARA HIROTOMO?[JP] UNO TOSHIYUKI?[JP] ISHIKAWA ICHIRO?[JP] SAKAKI KENICHI?[JP] |
| 39 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | XU BEICHENG LI WEIHAO LI HUANLING LI XINCHANG LIN JINXIANG |
| 40 | Euv Light Generation System And Production Method Of Electronic Device | NISHIMURA YUICHI UENO YOSHIFUMI |
| 41 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | SON JUNG-PIL XU BEICHENG LI XINCHANG |
| 42 | Euv Euv Euv Euv-Level Substrate Euv Mask Base Euv Mask And Method Of Manufacturing Same | JI MINGHUA DONG YUHU HUANG ZAOHONG |
| 43 | Euv Photomask And Manufacturing Method Thereof | XUE WENZHANG LIAN DACHENG LI XINCHANG |
| 44 | Pellicle For Euv Lithography With Cnt Film And Method For Forming Film Of The Same | CHOI MUN SU HONG JU HEE PARK CHUL KYUN KIM DONG HOI |
| 45 | Detection Method Of Euv Pellicle Status | LIU YEN-HAO?[TW] WANG SHAO-HUA?[TW] ZHANG ZHENG-HAO?[TW] LIN FAN-CHI?[TW] KUO CHUEH-CHI?[TW] CHEN LI-JUI?[TW] LIU HENG-HSIN?[TW] |
| 46 | Euv The Forming Method Of Graphene For Pellicle Membrane Of Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 47 | Euv The Forming Method Of Graphene Membrane To Have Capping Layer For Pellicle Of Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 48 | Euv Euv Reflection-Type Mask Blank For Euv Lithography Reflection-Type Mask For Euv Lithography And Manufacturing Methods Therefor | AKAGI DAIJIRO?[JP] KAWAHARA HIROTOMO?[JP] SASAKI KENICHI?[JP] ISHIKAWA ICHIRO?[JP] UNO TOSHIYUKI?[JP] |
| 49 | Extreme Ultraviolet Lithography Method And Euv Photomask | LEE CHIEN-MIN?[TW] CHEN YEN-LIANG?[TW] LIN SHY-JAY?[TW] CHEN LEE-FENG?[TW] TAI KUO LUN?[TW] |
| 50 | Phase Shift Blankmask And Photomask For Euv Lithography | PARK MIN-KWANG?[KR] PARK MIN-KYU?[KR] WOO MI-KYUNG?[KR] YANG CHUL-KYU?[KR] KIM YONG-DAE?[KR] |
| 51 | Blankmask For Euv Lithography With Absorbing Film, And Photomask Fabricated With The Same | PARK MIN-KYU?[KR] WOO MI-KYUNG?[KR] PARK MIN-KWANG?[KR] YANG CHUL-KYU?[KR] |
| 52 | Membrane For Euv Lithography | HOUWELING ZOMER SILVESTER?[NL] GHIASI KABIRI MAHNAZ?[NL] GIESBERS ADRIANUS JOHANNES MARIA?[NL] BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA?[NL] |
| 53 | Preferential Infiltration In Lithographic Process Flow For Euv Car Resist | ALVA GABRIELA?[US] HAN ZHEN-XING?[CN] SACHAN MADHUR?[IN] LANG CHI-I?[US] ZHOU LIN?[CN] LIU LEQUN?[US] KAZEM NASRIN?[US] |
| 54 | Enhanced Ultra-Thin, Ultra-Low Density Films For Euv Lithography And Method Of Producing Thereof | LIMA MARCIO D?[US] UEDA TAKAHIRO?[US] |
| 55 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | LIN YUN-YUE?[TW] |
| 56 | Methods And Related Systems For Depositing Euv Sensitive Films | PATEL KISHAN ASHOKBHAI?[IN] TOMCZAK YOANN?[FR] DEZELAH CHARLES?[US] ZYULKOV IVAN?[RU] DE ROEST DAVID KURT?[BE] GIVENS MICHAEL?[US] PIUMI DANIELE?[IT] |
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